Machine Learning-Based Prediction of Atomic Layer Control for MoS<sub>2</sub> via Reactive Ion Etcher-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Machine Learning-Based Prediction of Atomic Layer Control for MoS₂ via Reactive Ion Etcher

Published:2023-08-11 Issue:5 Volume:32 Page:106-109
ISSN:2288-6559
Container-title:Applied Science and Convergence Technology
language:en
Short-container-title:Appl. Sci. Converg. Technol.

Author:

Kim Changmin¹^ORCID,Lee Seunghwan²^ORCID,Kim Muyoung¹^ORCID,Choi Min Sup³^ORCID,Kim Taesung²⁴^ORCID,Kim Hyeong-U¹^ORCID

Affiliation:

1. Department of Plasma Engineering, Korea Institute of Machinery and Materials, Daejeon 34103, Republic of Korea

2. School of Mechanical Engineering, Sungkyunkwan University, Suwon 16419, Republic of Korea

3. Department of Materials Science and Engineering, Chungnam National University, Daejeon 34134, Republic of Korea

4. SKKU Advanced Institute of Nanotechnology, Sungkyunkwan University, Suwon 16419, Republic of Korea

Funder

Ministry of Trade, Industry and Energy

Korea Institute of Machinery and Materials

Publisher

The Korean Vacuum Society

Subject

General Medicine,Electrical and Electronic Engineering,Physical and Theoretical Chemistry,Condensed Matter Physics,Materials Science (miscellaneous)

Link

https://pdf.medrang.co.kr/ASCT/2023/032/ASCT032-05-106.pdf

Reference20 articles.

1. Developments of Plasma Etching Technology for Fabricating Semiconductor Devices

2. Overview of atomic layer etching in the semiconductor industry

3. Plasma-etching processes for ULSI semiconductor circuits

4. Plasma etching—A discussion of mechanisms

5. Numerical Simulation of the Ion Etching Process

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP