Nanolithography in the quasi-far field based on the destructive interference effect of surface plasmon polaritons-Reference-Cited by-同舟云学术

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Nanolithography in the quasi-far field based on the destructive interference effect of surface plasmon polaritons

Published:2010-04-05 Issue:5 Volume:27 Page:973
ISSN:1084-7529
Container-title:Journal of the Optical Society of America A
language:en
Short-container-title:J. Opt. Soc. Am. A

Author:

Wan Xia,Wang Qingkang,Tao Haihua

Funder

Shanghai Committee of Science and Technology of China

Publisher

The Optical Society

Subject

Computer Vision and Pattern Recognition,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference20 articles.

1. Challenges and progress in x-ray lithography

2. Precise voltage contrast image assisted positioning forin situelectron beam nanolithography for nanodevice fabrication with suspended nanowire structures

3. Sub-diffraction-limited patterning using evanescent near-field optical lithography

4. Energy flow in light-coupling masks for lensless optical lithography

5. Subwavelength photolithography based on surface-plasmon polariton resonance

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Insight of limitations of effective media theory for metal–dielectric multilayer metamaterials;Optics Communications;2013-09

2. Aberration-like cusped focusing in the post-paraxial Talbot effect;Journal of Optics;2012-06-21

3. Tunable surface plasmons interference patterns with the same mask in nanolithography;Optical Engineering;2012-02-29

4. Quasi-Talbot effect of the sub-wavelength Ag grating;Optics Communications;2010-12

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