Rigorous simulation model of double-Ronchi shearing interferometry on lithographic tools-Reference-Cited by-同舟云学术

Rigorous simulation model of double-Ronchi shearing interferometry on lithographic tools

Published:2023-06-12 Issue:18 Volume:62 Page:4759
ISSN:1559-128X
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Niu Zhiyuan¹,Li Sikun²^ORCID,Liu Yang²

Affiliation:

1. Dongfang Jingyuan Electron Ltd.

2. University of the Chinese Academy of Science

Abstract

Double-Ronchi shearing interferometry is widely used in wavefront aberration measurements for advanced lithography projection lens systems. A rigorous simulation model of double-Ronchi shearing interferometry on lithographic tools is the precondition for phase-shifting retrieval algorithm design and error analysis. This paper presents a rigorous simulation model of double-Ronchi shearing interferometry considering the vector nature of light. The model is accurate and can be used in the study of double-Ronchi shearing interferometry.

Funder

National Natural Science Foundation of China

Publisher

Optica Publishing Group

Subject

Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering

Reference26 articles.

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