Affiliation:
1. Dongfang Jingyuan Electron Ltd.
2. University of the Chinese Academy of Science
Abstract
Double-Ronchi shearing interferometry is widely used in wavefront
aberration measurements for advanced lithography projection lens
systems. A rigorous simulation model of double-Ronchi shearing
interferometry on lithographic tools is the precondition for
phase-shifting retrieval algorithm design and error analysis. This
paper presents a rigorous simulation model of double-Ronchi shearing
interferometry considering the vector nature of light. The model is
accurate and can be used in the study of double-Ronchi shearing
interferometry.
Funder
National Natural Science Foundation of
China
Subject
Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering