Analysis of microstructural relaxation phenomena in laser-modified fused silica using confocal Raman microscopy
Author:
Funder
U.S. Department of Energy
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference20 articles.
1. Raman studies of vitreous SiO2versus fictive temperature
2. Fictive temperature measurement of amorphous SiO2 films by IR method
3. Thermal expansion of synthetic fused silica as a function of OH content and fictive temperature
4. Theories of relaxation
5. Modeling laser texturing of silicate glass
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