Level-set based mask synthesis with a vector imaging model-Reference-Cited by-同舟云学术

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Level-set based mask synthesis with a vector imaging model

Published:2017-08-29 Issue:18 Volume:25 Page:21775
ISSN:1094-4087
Container-title:Optics Express
language:en
Short-container-title:Opt. Express

Author:

Shen Yijiang

Funder

Guangzhou Science and Technology Program key projects

Natural Science Foundation of Guangdong Province

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference32 articles.

1. Resolution Enhancement Techniques in Optical Lithography

2. TCAD development for lithography resolution enhancement

3. Optical Imaging in Projection Microlithography

4. Phase-shifting masks for microlithography: automated design and mask requirements

5. Mask Design for Optical Microlithography—An Inverse Imaging Problem

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3. Inverse Lithography with Adaptive Mask Complexity;2024 Conference of Science and Technology for Integrated Circuits (CSTIC);2024-03-17

4. 先进计算光刻;Laser & Optoelectronics Progress;2022

5. 计算光刻研究及进展;Laser & Optoelectronics Progress;2022

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