Ultrathin, reflective light-field imaging film realized by self-releasing UV-curable nanoimprinting lithography

Abstract

Light-field imaging has emerged as a technology allowing the capture of richer visual information from the world. Ultrathin, reflective light-field imaging film is fabricated by using self-releasing ultraviolet (UV)-curable nanoimprinting lithography. The plenoptic function is built to generate the dense reflective light field in a two-dimension plane in which the occlusion perception can be seamlessly incorporated in the recording process. A self-releasing nanoimprinting technique is developed to realize the imaging film with a thickness of 25 µm and a full field of view (FOV). The results pave the way toward developing high-performance light-field imaging device that can be used as a visual security feature or in virtual/augmented reality and computer vision applications, etc.