Efficient and rigorous three-dimensional model for optical lithography simulation-Reference-Cited by-同舟云学术

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Efficient and rigorous three-dimensional model for optical lithography simulation

Published:1996-11-01 Issue:11 Volume:13 Page:2187
ISSN:1084-7529
Container-title:Journal of the Optical Society of America A
language:en
Short-container-title:J. Opt. Soc. Am. A

Author:

Lucas Kevin D.,Tanabe Hiroyoshi,Strojwas Andrzej J.

Publisher

The Optical Society

Subject

Computer Vision and Pattern Recognition,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference7 articles.

1. Efficient light scattering modeling for alignment, metrology, and resist exposure in photolithography

2. Diffraction of a Plane Wave at a Sinusoidally Stratified Dielectric Grating

3. Diffraction by thick, periodically stratified gratings with complex dielectric constant

4. Theory of optical edge detection and imaging of thick layers

5. Optical microscope imaging of lines patterned in thick layers with variable edge geometry: theory

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1. Weakly guiding approximation of a three-dimensional waveguide model for extreme ultraviolet lithography simulation;Journal of the Optical Society of America A;2024-07-08

2. Pre-training CNN for fast EUV lithography simulation including M3D effects;DTCO and Computational Patterning III;2024-04-10

3. Accelerating extreme ultraviolet lithography simulation with weakly guiding approximation and source position dependent transmission cross coefficient formula;Journal of Micro/Nanopatterning, Materials, and Metrology;2024-01-02

4. Accelerating EUV lithography simulation with weakly guiding approximation and STCC formula;International Conference on Extreme Ultraviolet Lithography 2023;2023-11-21

5. Dark field imaging of high aspect ratio structures – a simple model;Optics Express;2023-11-03

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