Inverted Hartmann mask made by deep X-ray lithography for single-shot multi-contrast X-ray imaging with laboratory setup

Author:

Mikhaylov Andrey1ORCID,Zakharova Margarita1ORCID,Vlnieska Vitor2,Khanda Ankita1,Bremer Sabine34,Zuber Marcus34ORCID,Henrique Pezzin Sergio5,Kunka Danays1

Affiliation:

1. Karlsruhe Institute of Technology (KIT)

2. Currently at Swiss Federal Laboratories for Materials Science and Technology (EMPA)

3. Institute for Photon Science and Synchrotron RadiationKarlsruhe Institute of Technology

4. Karlsruhe Institute of Technology

5. State University of Santa Catarina

Abstract

This paper reports on the fabrication and characterization of an inverted Hartmann mask and its application for multi-contrast X-ray imaging of polymer composite material in a laboratory setup. Hartmann masks open new possibilities for high-speed X-ray imaging, obtaining orientation-independent information on internal structures without rotating the object. The mask was manufactured with deep X-ray lithography and gold electroplating on a low-absorbing polyimide substrate. Such an approach allows us to produce gratings with a small period and high aspect ratio, leading to a higher spatial resolution and extension towards higher X-ray energies. Tuning the manufacturing process, we achieved a homogeneous patterned area without supporting structures, thus avoiding losses on visibility. We tested mask performance in a laboratory setup with a conventional flat panel detector and assessed mask imaging capabilities using a tailored phantom sample of various sizes. We performed multi-modal X-ray imaging of epoxy matrix polymer composites reinforced with glass fibers and containing microcapsules filled with a healing agent. Hartmann masks made by X-ray lithography enabled fast-tracking of structural changes in low absorbing composite materials and of a self-healing mechanism triggered by mechanical stress.

Publisher

Optica Publishing Group

Subject

Atomic and Molecular Physics, and Optics

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