Improved grating reconstruction by determination of line roughness in extreme ultraviolet scatterometry-Reference-Cited by-同舟云学术

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Improved grating reconstruction by determination of line roughness in extreme ultraviolet scatterometry

Published:2012-12-13 Issue:24 Volume:37 Page:5229
ISSN:0146-9592
Container-title:Optics Letters
language:en
Short-container-title:Opt. Lett.

Author:

Henn Mark-Alexander,Heidenreich Sebastian,Gross Hermann,Rathsfeld Andreas,Scholze Frank,Bär Markus

Funder

European Metrology Research Program

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference12 articles.

1. Spectroscopic ellipsometry and reflectometry from gratings (Scatterometry) for critical dimension measurement and in situ, real-time process monitoring

2. Multiparameter grating metrology using optical scatterometry

3. Characterization of extreme ultraviolet masks by extreme ultraviolet scatterometry

4. Use of EUV scatterometry for the characterization of line profiles and line roughness on photomasks

5. Effect of line and trench profile variation on specular and diffuse reflectance from a periodic structure

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