Global search algorithms in an automated design of starting points for a deep-UV lithography objective

Abstract

In this paper we investigated a design approach based on, to our knowledge, novel algorithms in automated lens design, specifically for design of deep-ultraviolet (DUV) projection lenses. A comprehensive global search for optimal starting points has been conducted by coding macros within lens design software. The findings of the study reveal that achieving a diffraction-limited system requires careful adjustments of global search parameters and strategic compromises to balance various constraints of the telecentric objective. The results demonstrate the practical value of a global search method for obtaining starting points of a bi-telecentric optical system with a large number of variables. The feasibility of the proposed design approach is verified by designing a deep-UV lithography objective that meets the requirements of micro-lithography. Using this design approach, designers can easily manage the starting point exploration and bypass the many steps of an analytical design process for high-resolution objectives.