Gratings for metrology and process control 1: A simple parameter optimization problem
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Publisher
The Optical Society
Reference9 articles.
1. Optical Monitoring of the Etching of SiO2 and Si3 N 4 on Si by the Use of Grating Test Patterns
2. Optical monitoring of the end point in thin film plasma etching
3. Index and surface simultaneous modulation in negative photoresist films
4. Linewidth measurement on IC masks and wafers by grating test patterns
5. Electromagnetic grating theories: Limitations and successes
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1. Holographic technique for measurement of the kinetic constant and optical modulation of photosensitive materials;Applied Optics;2010-06-14
2. Thin-film interferometry of patterned surfaces;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1995-05
3. Diffractive techniques for lithographic process monitoring and control;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1994-11
4. Reactive ion etching profile and depth characterization using statistical and neural network analysis of light scattering data;Journal of Applied Physics;1993-09-15
5. Latent image diffraction from submicron photoresist gratings;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1992-09
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