Fluoride antireflection coatings for deep ultraviolet optics deposited by ion-beam sputtering
Author:
Publisher
The Optical Society
Reference8 articles.
1. Development of High-Reflection Mirrors of Fluoride Multilayers for F2Excimer Laser by Ion Beam Sputtering Method
2. Water immersion optical lithography for 45-nm node
3. Immersion lithography; its potential performance and issues
4. Ultraviolet optical and microstructural properties of MgF_2 and LaF_3 coatings deposited by ion-beam sputtering and boat and electron-beam evaporation
5. Film structure and optical constants of magnetron-sputtered fluoride films for deep ultraviolet lithography
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