Optical patterning of features with spacing below the far-field diffraction limit using absorbance modulation
Author:
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference20 articles.
1. Beiträge zur Theorie des Mikroskops und der mikroskopischen Wahrnehmung
2. Super-resolution Aperture Scanning Microscope
3. Breaking the Diffraction Barrier: Optical Microscopy on a Nanometric Scale
4. Implications of high resolution to near-field optical microscopy
5. Fabrication of sub-100nm Patterns using Near-field Mask Lithography with Ultra-thin Resist Process
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