Four-quadrant gratings moiré fringe alignment measurement in proximity lithography-Reference-Cited by-同舟云学术

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Four-quadrant gratings moiré fringe alignment measurement in proximity lithography

Published:2013-02-04 Issue:3 Volume:21 Page:3463
ISSN:1094-4087
Container-title:Optics Express
language:en
Short-container-title:Opt. Express

Author:

Zhu Jiangping,Hu Song,Yu Junsheng.,Zhou Shaolin,Tang Yan,Zhong Min,Zhao Lixin,Chen Minyong,Li Lanlan,He Yu,Jiang Wei

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference27 articles.

1. Pattern-Integrated Interference Lithography: Prospects for Nano- and Microelectronics

2. Lithography gets extreme

3. Synthetic approach to designing optical alignment systems

4. Nanometer scattered-light alignment system using SiC x-ray masks with low optical transparency

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1. Simple visual focusing and alignment technology for digital lithography;Optics and Lasers in Engineering;2024-10

2. An Adjustment Strategy for Tilted Moiré Fringes via Deep Q-Network;Photonics;2024-07-17

3. Two-dimensional Hanning self-convolution window for enhancing Moiré fringe alignment in lithography;Mechanical Systems and Signal Processing;2024-02

4. Depth–Depth of Focus Moiré Fringe Alignment via Broad-Spectrum Modulation;Photonics;2024-01-31

5. High-precision moiré alignment method using centrosymmetric grating for 3D interlayer interconnect;Optics and Lasers in Engineering;2023-12

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