Novel figuring method for a multilayer Laue lens

Abstract

A new, to the best of our knowledge, figuring method for a multilayer Laue lens (MLL) in the hard X-ray region is proposed in this paper. Theoretical simulation at 20 keV shows that the figuring method can compensate for the structure error. The phase errors of the first-order diffracted wave decrease from 0.85π to 0.26π after figuring. The spatial resolution changes from 45 nm to 26 nm after figuring, which is almost the same as that of the ideal MLL with a spatial resolution of 24 nm. The figured MLL can achieve 36% of the ideal MLL's first-order diffraction efficiency. Such method may reduce the requirements for the fabrication of the MLLs, and may make it possible to manufacture the larger numerical aperture MLL with the longer working distance in the future.