Author:
Ekielski Marek,Zadura Magdalena,Bogdanowicz Karolina,Szerling Anna,Głowadzka Weronika,Czyszanowski Tomasz,Petrovic Borislav,Bader Andreas,Hartmann Fabian,Höfling Sven
Abstract
In this paper we present results of metalMHCG fabrication for GaSb-based ICLED by means of electron beam lithography, e-beam metal evaporation and plasma etching process. Configuration of metalMHCG was designed to maximize transmittance of TE polarized light in the mid-infrared wavelength region.