Multilayer-coating-induced aberrations in extreme-ultraviolet lithography optics
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Publisher
The Optical Society
Reference4 articles.
1. Coating-induced wave-front aberrations: on-axis astigmatism and chromatic aberration in all-reflecting systems
2. Effects of Mo/Si multilayer coatings on the imaging characteristics of an extreme-ultraviolet lithography system
3. Optical Design for Soft X-Ray Projection Lithography
4. Reduction imaging at 14 nm using multilayer-coated optics: Printing of features smaller than 0.1 μm
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1. Genetic optimization of aperiodic multilayer masks for high and hyper-NA EUV lithography;Optical and EUV Nanolithography XXXVII;2024-04-10
2. High efficiency graded multilayer coating design using least-square fitting for NA0.55 extreme ultraviolet lithography Objective;2022 International Workshop on Advanced Patterning Solutions (IWAPS);2022-10-21
3. Design and collaborative optimization method of multilayer coatings to correct polarization aberration of optical systems;Optics Express;2022-08-05
4. Graded Multilayer Film Design Method of Anamorphic Magnification Extreme Ultraviolet Lithography Objective System;Acta Optica Sinica;2020
5. A model for multilayer analysis in a coated extreme ultra-violet lithography projection system;Optics Communications;2014-12
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