Foundry compatible, efficient wafer-scale manufacturing of ultra-low loss, high-density Si3N4 photonic integrated circuits

Abstract

We demonstrate ultra-low propagation loss, lithographic precision, and wafer-scale manufacturing for high-density Si3N4 photonic integrated circuits using an efficient DUV-based subtractive approach. We show a propagation loss as low as 1.4 dB/m at 1.55 µm.