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Analysis of Si+-implanted Nd:YVO4 crystal: the relation between lattice damage and waveguide formation

  • Published:2012-08-02 Issue:23 Volume:51 Page:5657
  • ISSN:1559-128X
  • Container-title:Applied Optics
  • language:en
  • Short-container-title:Appl. Opt.

Author:

Ma Yu-Jie,Lu Fei,Ming Xian-Bing,Chen Ming,Liu Xiu-Hong,Yin Jiao-Jian

Funder

National Nature Science Foundation of China (NSFC)

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering

Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Radiation effects on He+- and H+-implantation for ion slicing of rutile titanium dioxide thin film;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2022-12

2. Fabrication of a rutile titanium dioxide thin film heterostructure using ion-implantation with Cu-Sn bonding;Optical Materials Express;2021-03-22

3. Damage formation and recovery in Nd:CNGG crystal by carbon ion implantation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2020-01

4. Optical and spectral properties of Ho:Yb:YVO4 crystal irradiated by 6.0-MeV C ions;Physica B: Condensed Matter;2019-04

5. Fabrication of TiO2 thin films with both anatase and rutile structures together using the ion-implantation method;Optical Materials Express;2018-02-06
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