Author:
Rockett Paul D.,Hunter John A.,Kubiak Glenn D.,Berger Kurt W.
Abstract
The efficiency of XUV production from a laser-plasma directly relates to the cost of fielding such a source for projection x-ray lithography (PXRL). Measurements of the radiated conversion efficiency were made on the Sandia National Laboratories Laser Plasma Source (LPS), a bright reliable point x-ray source. The LPS was designed for use as a prototype XUV source for PXRL, and included a Lambda Physik KrF laser focussed weakly onto a rotating target drum. The laser produced 1.1J pulses at 248nm in 27ns and could be operated up to 100Hz. Focal intensities on target were in the low 1010 W/cm2 using a 1m focal length simple lens.