Optimizing deposition parameters of electron beam evaporated TiO_2 films-Reference-Cited by-同舟云学术

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Optimizing deposition parameters of electron beam evaporated TiO_2 films

Published:1988-12-01 Issue:23 Volume:27 Page:4920
ISSN:0003-6935
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Lehmann Hans W.,Frick K.

Publisher

The Optical Society

Reference5 articles.

1. Deposition of Oxide Films by Reactive Evaporation

2. Refractive indices of TiO_2 films produced by reactive evaporation of various titanium–oxygen phases

3. Ion-assisted deposition of optical thin films: low energy vs high energy bombardment

4. Single-chip color camera using a frame-transfer CCD

5. Fabrication of mosaic color filters by dry‐etching dielectric stacks

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