Plasmonic crystals fabricated by nanosphere lithography for advanced biosensing

Abstract

Plasmonic nanostructures have attracted wide attention in the past few years for their promising applications such as surface-enhanced spectroscopies, chemical or biosensing, and so on. However, the fabrication of plasmonic nanostructures relies on traditional photolithography methods such as electron beam lithography and focused ion beam lithography, which have inherent shortcomings, such as high fabrication cost and being time-consuming. Here, using the nanosphere lithography approach, we fabricate large-area long-range ordered periodic Au nanohole arrays on an opaque Au substrate. The structure supports spectral-isolation and well-defined plasmonic resonances favorable to spectral monitoring at normal incidence of light. The bulk sensitivity of up to 403 nm/RIU is measured for the plasmon modes. Furthermore, we assess the surface-sensing performance of the system and obtain a near-field decay length of about 240 nm, meaning that it is desirable to detect the biological protein molecules. The suggested plasmonic-sensing platform has broad application prospects in the development of low-cost and high-throughput biosensor chips.