Gradient-based inverse extreme ultraviolet lithography

Author:

Ma Xu,Wang Jie,Chen Xuanbo,Li Yanqiu,Arce Gonzalo R.

Funder

Beijing Institute of Technology

National Natural Science Foundation of China (NSFC)

National Science and Technology Major Project

Program of Education Ministry for Changjiang Scholars in University

Program for New Century Excellent Talents in University

Technology Foundation for Selected Overseas Chinese Scholar

Publisher

The Optical Society

Cited by 10 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Effective multi-objective inverse lithography technology at full-field and full-chip levels with a hybrid dynamic priority algorithm;Optics Express;2023-05-24

2. 衍射光学元件设计方法综述;Acta Optica Sinica;2023

3. Mask 3D model based on complex-valued convolution neural network for EUV lithography;2022 International Workshop on Advanced Patterning Solutions (IWAPS);2022-10-21

4. Full field wavefront error aware source and mask optimization for extreme ultraviolet lithography;Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology;2022-09-16

5. 计算光刻研究及进展;Laser & Optoelectronics Progress;2022

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