Effect of etching morphology of artificial defect on laser-induced damage properties under 355 nm laser irradiation-Reference-Cited by-同舟云学术

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Effect of etching morphology of artificial defect on laser-induced damage properties under 355 nm laser irradiation

Published:2015-04-09 Issue:11 Volume:54 Page:3365
ISSN:0003-6935
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Ma Bin,Lu Menglei,Zhan Guangda,Wang Ke,Cheng Xinbin,Wang Zhanshan

Funder

Fundamental Research Funds for the Central Universities

National Major Research Equipment Development Project

National Natural Science Foundation of China (NSFC)

Publisher

The Optical Society

Reference22 articles.

1. Subsurface damage measurement of ground fused silica parts by HF etching techniques

2. Subsurface damage and polishing compound affect the 355-nm laser damage threshold of fused silica surfaces

3. Study of the evolution of mechanical defects on silica samples under laser irradiation at 355 nm

4. Damage growth characteristics of different initial damage sites of fused silica under 355nm small laser beam irradiation

5. The effect of an electric field on the thermomechanical damage of nodular defects in dielectric multilayer coatings irradiated by nanosecond laser pulses

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Characterization of artificial indentation defects in fused silica surface and its damage performance under 355 nm nanosecond laser;Optics & Laser Technology;2023-09

2. Mechanism and conditions for laser cleaning of micro and nanoparticles on the surface of transparent substrate;Vacuum;2022-06

3. 湿法刻蚀处理熔石英光学元件研究进展;Laser & Optoelectronics Progress;2021

4. Effect of brittle scratches on transmission of optical glass and its induced light intensification during the chemical etching;Optical Engineering;2017-10-10

5. Surface roughness and morphology evolution of optical glass with micro-cracks during chemical etching;Applied Optics;2017-01-19

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