Error analysis in inverse scatterometry I Modeling
Author:
Publisher
The Optical Society
Subject
Computer Vision and Pattern Recognition,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference9 articles.
1. Light-scattering-based micrometrology
2. Comparison of solutions to the scatterometry inverse problem
3. Lithographic process monitoring using diffraction measurements
4. Linearized inversion of scatterometric data to obtain surface profile information
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