Author:
Pomfret Jonathan,Cai Sijia,Han Daxing,Gibson Des,Song Shigeng,Hutson David,Mackay Peter
Abstract
A patterned dual colour filter has been deposited by microwave plasma assisted pulsed DC sputtering (MPAS) and photolithography. Compatibility between MPAS and photolithography for fabrication of patterned optical filters has been demonstrated.