Author:
Chen Hsi-Chao,Zheng Xin-Ya,Chen Sheng-Bin,Wu Ming-Ying,Lee Szu-Hui
Abstract
The four-layer anti-reflection films of HfO2/SiO2
was prepared on flexible substrate by E-gun evaporation with ion-beam
assisted deposition. Finite element method combined the shell theory
to investigate the residual stress.