Source characterization for x-ray proximity lithography
Author:
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference9 articles.
1. High-energy x-ray response of photographic films: models and measurement
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1. Study of the generation of the 13.5-nm EUV radiation from Sn ions in a CO2 laser-produced plasma;Plasma Physics Reports;2010-02
2. Simulation of Ni-like and Co-like X-rays emitted from laser produced tin plasmas;Czechoslovak Journal of Physics;2006-10
3. Hot Ion Beam Generation from Rare-Gas Cryogenic Targets;Japanese Journal of Applied Physics;2004-06-18
4. Soft x-ray emission of laser-produced plasmas using a low-debris cryogenic nitrogen target;Journal of Applied Physics;1998-09-15
5. Droplet‐target laser‐plasma source for proximity x‐ray lithography;Applied Physics Letters;1996-05-06
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