Effect of background pressure on Co/C multilayers-Reference-Cited by-同舟云学术

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Effect of background pressure on Co/C multilayers

Published:2016-10-27 Issue:4 Volume:56 Page:C16
ISSN:0003-6935
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Wen Mingwu,Ma Shuang,Huang Qiushi,Jiang Li,Li Ping,Zhang Zhong,Wang Zhanshan,Wang Delai,Cui Mingqi

Funder

National Basic Research Program of China

National Natural Science Foundation of China (NSFC)

Publisher

The Optical Society

Reference20 articles.

1. Mechanical and physical properties of C and C–Cr sputter coatings measured at the nano-scale

2. High reflectance Cr/C multilayer at 250eV for soft X-ray polarimetry

3. X-ray Schwarzschild objective for the carbon window (λ~45 nm)

4. Polarization Property Measurement of the Long Undulator Radiation Using Cr/C Multilayer Polarization Elements

5. Application of free-standing multilayer films as polarizers for X-ray radiation

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Background Pressure Induced Structural and Chemical Change in NiV/B4C Multilayers Prepared by Magnetron Sputtering;Frontiers in Physics;2022-03-10

2. 不同本底真空制备的Yb/Al多层膜结构和反射率研究;ACTA PHOTONICA SINICA;2021

3. Computer-aided assembly of X-ray parabolic cylinder laterally graded multilayer reflector to collimate divergent beam in XRD;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;2018-10

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