Silicon-tapered waveguide for mode conversion in metal–insulator–metal waveguide-based plasmonic sensor for refractive index sensing

Abstract

In this study, we have undertaken a comprehensive numerical investigation of a refractive index sensor designed around a metal–insulator–metal (MIM) plasmonic waveguide. Our approach utilizes the finite element method to thoroughly analyze the sensor’s performance. The sensor’s configuration utilizes a ring resonator design, which has been slightly modified at the coupling segment. This modification enhances the efficiency of light coupling between a bus waveguide and the ring resonator, particularly at the resonance wavelength. This strategic adjustment significantly improves the device’s extinction ratio, a critical factor in its functionality. Remarkably, the sensitivity of this sensor is determined to be approximately 1155.71 nm/RIU, while it possesses a figure of merit of 25.9. Furthermore, our study delves into the intricate mechanism governing the injection of light into the nanoscale MIM waveguide. We achieve this through the incorporation of silicon-tapered waveguides, which play a pivotal role in facilitating the transformation of a dielectric mode into a plasmonic mode, and vice versa. Ultimately, the findings of this research hold significant promise for advancing the field of plasmonic sensing systems based on MIM waveguide technology. The insights gained here pave the way for the practical realization and optimization of highly efficient and precise plasmonic sensors.