Abstract
A Ge metal–semiconductor–metal photodetector covered with asymmetric
H
f
S
e
2
contact geometries has been proposed to realize high-performance unbiased photodetection at 1550 nm. At -1 V bias, the responsivity of this device shows a 71% improvement compared to the device without
H
f
S
e
2
. Moreover, the responsivity and detectivity of this device at zero bias can reach to 71.2 mA/W and
3.27
×
10
10
Jones, respectively. Furthermore, the fall time of this device is 2.2 µs and 53% shorter than the device without
H
f
S
e
2
. This work provides a feasible way to develop unbiased Ge-based photodetectors in the near-IR communications band.
Funder
National Key Research and Development Program of China
Subject
Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering
Cited by
4 articles.
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