Single-photon avalanche diode fabricated in standard 55 nm bipolar-CMOS-DMOS technology with sub-20 V breakdown voltage

Author:

Ha Won-Yong1,Park Eunsung2,Eom Doyoon2,Park Hyo-Sung2,Chong Daniel3,Tan Shyue Seng3,Tng Michelle3,Quek Elgin3,Bruschini Claudio1ORCID,Charbon Edoardo1,Choi Woo-Young2,Lee Myung-JaeORCID

Affiliation:

1. Institute of Microengineering

2. Yonsei University

3. GLOBALFOUNDRIES Singapore Pte. Ltd.

Abstract

This paper presents a single-photon avalanche diode (SPAD) in 55 nm bipolar-CMOS-DMOS (BCD) technology. In order to realize a SPAD having sub-20 V breakdown voltage for mobile applications while preventing high tunneling noise, a high-voltage N-well available in BCD is utilized to implement the avalanche multiplication region. The resulting SPAD has a breakdown voltage of 18.4 V while achieving an excellent dark count rate of 4.4 cps/µm2 at the excess bias voltage of 7 V in spite of the advanced technology node. At the same time, the device achieves a high peak photon detection probability (PDP) of 70.1% at 450 nm thanks to the high and uniform E-field. Its PDP values at 850 and 940 nm, wavelengths of interest for 3D ranging applications reach 7.2 and 3.1%, respectively, with the use of deep N-well. The timing jitter of the SPAD, full width at half maximum (FWHM), is 91 ps at 850 nm. It is expected that the presented SPAD enables cost-effective time-of-flight and LiDAR sensors with the advanced standard technology for many mobile applications.

Funder

Korea Institute of Science and Technology

Publisher

Optica Publishing Group

Subject

Atomic and Molecular Physics, and Optics

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