Polarization-independent microchannel in a high-speed-scan femtosecond laser-assisted etching of fused silica

Author:

Yao Qian,Yin Weiyi,Yao Heng,Shi Huiqiang,Su Zihuai,Zeng Xianglong1ORCID,Shi Xiaoning1,Zhao Wancong1,Dai YeORCID

Affiliation:

1. Shanghai University

Abstract

Microchannels fabricated by femtosecond laser-assisted chemical etching are of great use in biochemical analysis. In this paper, we study the morphology change of etched microchannels in fused silica by controlling the laser scan speed, and we find a significant difference between the chemical etched length and volume. The fabricated microchannels would gradually become tapered along the scan direction, which influences the flow of the hydrofluoric (HF) reagent and the etching rate. As a result, the difference ratios of the etched length and volume, respectively, reach 5.56 % and 41.83 % followed by the scan speed increasing from 5 to 200 µm/s. Microchannels with polarization independence and better aspect ratio could be obtained in a high-speed-scan mode. We suggest that laser-induced structural transformation from interconnected microcracks to nanogratings could be responsible for this change. Aforementioned results offer a feasible approach to achieve polarization-independent microchannels, which is in favor of accelerating the fabrication of three-dimensional microfluidic devices.

Funder

National Natural Science Foundation of China

Science and Technology Commission of Shanghai Municipality

Publisher

Optica Publishing Group

Subject

Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering

Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Optimization of Laser-induced Deep Etching for TGV Fabrication in Fused Silica;2023 24th International Conference on Electronic Packaging Technology (ICEPT);2023-08-08

2. Optimization of fs + ps double-pulse sequence parameters for laser-assisted chemical etching of microchannels in fused silica;Journal of Physics D: Applied Physics;2023-04-21

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