High-quality binary fringe generation by multi-scale optimization on intensity and phase

Abstract

The optimization-based binary fringe generation method can greatly improve the quality of projected fringes for structured light measurement. However, the existing phase-based and intensity-based methods are either sensitive to the projector defocus levels or cannot reduce the phase error efficiently, and these two methods only optimize the phase or intensity at a single defocus scale. A new method is proposed to optimize the intensity and phase of binary fringe on multiple defocus scales, to the best of our knowledge, which can effectively reduce the phase error and ensure its robustness. The algorithm is accelerated by block optimization. We also proposed a strategy based on objective index evaluation to simplify the process of selecting the best binary patch. Simulation and experiment results show that the binary fringe generated by the proposed method is of high-phasing quality while keeping robust to different defocus levels of the projector.