Photoalignment of sub-micrometer periodic liquid crystal polarization grating by using the optical imprinting method

Abstract

Photoalignment of liquid crystal polarization grating based on optical imprinting is a promising technique for polarization grating mass production. However, when the period of the optical imprinting grating is in the sub-micrometer level, the zero-order energy from the master grating will become high, and it will strongly affect the photoalignment quality. This paper proposes a double-twisted polarization grating structure to eliminate the zero-order disturbance of master grating and gives the design method. Based on the designed results, a master grating was prepared, and the optically imprinted photoalignment of polarization grating with a period of 0.5μm was fabricated. This method has the advantages of high efficiency and significantly greater environmental tolerance than the traditional polarization holographic photoalignment methods. It has the potential to be used for large-area polarization holographic gratings production.