Fractional Talbot lithography with extreme ultraviolet light-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Fractional Talbot lithography with extreme ultraviolet light

Published:2014-12-15 Issue:24 Volume:39 Page:6969
ISSN:0146-9592
Container-title:Optics Letters
language:en
Short-container-title:Opt. Lett.

Author:

Kim Hyun-su,Li Wei,Danylyuk Serhiy,Brocklesby William S.,Marconi Mario C.,Juschkin Larissa

Funder

Education, Audiovisual and Culture Executive Agency (EACEA)

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference25 articles.

1. Nanolithography with coherent extreme ultraviolet light

2. Plasmonics: Merging Photonics and Electronics at Nanoscale Dimensions

3. Two-dimensional photonic-bandgap structures operating at near-infrared wavelengths

4. Observation of discrete electronic states in a zero-dimensional semiconductor nanostructure

5. Talbot effect reinterpreted

Cited by 16 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Plasmonic interference lithography based on the second-order diffracted wave of grating and hyperbolic multilayer graphene;Optics Continuum;2024-02-09

2. 单轴晶体中垂直光轴方向上的二维泰伯效应;Acta Optica Sinica;2023

3. Autofocusing self-imaging: symmetric Pearcey Talbot-like effect;Optics Express;2022-04-11

4. Dynamic manipulation of nonlinear Talbot effect with structured light;Optics Letters;2021-03-05

5. Scalable Talbot effect of periodic array objects;Chinese Optics Letters;2020

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3