Si-nanowire-based multistage delayed Mach–Zehnder interferometer optical MUX/DeMUX fabricated by an ArF-immersion lithography process on a 300 mm SOI wafer-Reference-Cited by-同舟云学术

Si-nanowire-based multistage delayed Mach–Zehnder interferometer optical MUX/DeMUX fabricated by an ArF-immersion lithography process on a 300 mm SOI wafer

Published:2014-06-16 Issue:13 Volume:39 Page:3702
ISSN:0146-9592
Container-title:Optics Letters
language:en
Short-container-title:Opt. Lett.

Author:

Jeong Seok-Hwan,Shimura Daisuke,Simoyama Takasi,Horikawa Tsuyoshi,Tanaka Yu,Morito Ken

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference12 articles.

1. Device Requirements for Optical Interconnects to Silicon Chips

2. Silicon CMOS-integrated nano-photonics for computer and data communications beyond 100G

3. Wavelength Division Multiplexing Based Photonic Integrated Circuits on Silicon-on-Insulator Platform

4. GHz-bandwidth optical filters based on high-order silicon ring resonators

5. Si micro-ring MUX/DeMUX WDM filters

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