Optimal nonlinear Stokes–Mueller polarimetry for multi-photon processes

Author:

Li Xiaobo12ORCID,Liu Wei1,Goudail François3,Chen Shih-Chi12ORCID

Affiliation:

1. The Chinese University of Hong Kong

2. Centre for Perceptual and Interactive Intelligence

3. Université Paris-Saclay

Abstract

In this Letter, we present an optimization model for nonlinear Stokes–Mueller polarimetry (SMP) to improve the precision in estimating the nonlinear Mueller matrix (MM) for two- and three-photon processes. Although nonlinear polarimeters can measure the polarization properties of multi-photon processes or materials, existing methods are suboptimal, leading to low measurement precision. Based on the model and its solution, we have designed a new measurement strategy to substantially reduce the estimation variance of nonlinear MM coefficients by approximately 58.2% for second-harmonic generation polarimetry and 78.7% for third-harmonic generation polarimetry. The model and measurement method can be directly applied to multi-photon processes to improve the precision of SMP.

Funder

Centre for Perceptual and Interactive Intelligence (CPII) Ltd under the Innovation and Technology Fund

Innovation and Technology Commission

Publisher

Optica Publishing Group

Subject

Atomic and Molecular Physics, and Optics

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