Consequences of Ti-, Li-, and Er-ion implantations on the optical properties of single layers of Ta_2O

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Consequences of Ti-, Li-, and Er-ion implantations on the optical properties of single layers of Ta_2O_5

Published:1996-09-01 Issue:25 Volume:35 Page:5085
ISSN:0003-6935
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Flory F.,Berthier D.,Rigneault H.,Roux L.

Publisher

The Optical Society

Reference6 articles.

1. Refractive index and inhomogeneity of thin films

2. A New Approach to the Determination of Planar Waveguide Profiles by Means of a Non-stationary Mode Index Calculation

3. Fluorescence of Er3+ ions in TiO2 planar waveguides prepared by a sol-gel process

4. Luminescence of erbium implanted in various semiconductors: IV, III-V and II-VI materials

5. Optical doping of waveguide materials by MeV Er implantation

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1. Refractive index variation of amorphous Ta2O5 film fabricated by ion beam sputtering with RF bias power;Optical Review;2009-05

2. Diffusion of Neodymium into Sputtered Films of Tantalum Pentoxide;Journal of the American Ceramic Society;2002-10

3. Spontaneous emission into planar multi-dielectric microcavities: Theoretical and experimental analysis of rare earth ion radiations;Optical Materials;1999-01

4. Titanium implantation in bulk and thin film amorphous silica;Journal of Applied Physics;1998-05-15

5. Characterization of inhomogeneous dielectric films by spectroscopic ellipsometry;Thin Solid Films;1998-02

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