Interstitial O2 and Si-H defects produced in fused silica during laser-induced damage-Reference-Cited by-同舟云学术

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Interstitial O2 and Si-H defects produced in fused silica during laser-induced damage

Published:2018-08-27 Issue:9 Volume:8 Page:2863
ISSN:2159-3930
Container-title:Optical Materials Express
language:en
Short-container-title:Opt. Mater. Express

Author:

Yan Chunyan,Liu Bao’an,Li Xiangcao,Liu Chang,Li Yuan,Ju Xin

Funder

Fundamental Research Funds for the central universities

National Natural Science Foundation of China (NSFC)

Publisher

The Optical Society

Subject

Electronic, Optical and Magnetic Materials

Reference21 articles.

1. National Ignition Facility laser performance status

2. The French Megajoule Laser Project (LMJ)

3. Design of 60-kJ SG-III laser facility and related technology development

4. Ab initio modeling of fused silica, crystal quartz, and water Raman spectra

5. The damage mechanisms of fused silica irradiated by 355nm laser in vacuum

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Improvement of Laser Damage Resistance of Fused Silica Using Oxygen-Aided Reactive Ion Etching;Photonics;2024-08-04

2. Experimental research on the dynamics of ultravioletlaser-induced damage;SCIENTIA SINICA Physica, Mechanica & Astronomica;2021-08-20

3. Characterisation of hydrogen ion implantation damage in quartz, lithium niobate and tellurium dioxide by Raman spectroscopy;Radiation Effects and Defects in Solids;2021-03-15

4. Multi-wavelength coupling effect of laser-induced defect damage in beam splitter films captured by a three-dimensional spatially and temporally resolved method;Optics & Laser Technology;2020-10

5. Different material modifications in laser-induced damage of optical films in air and vacuum environments;Thin Solid Films;2020-06

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