Depth of focus and the moment expansion
Author:
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference5 articles.
1. Improving resolution in photolithography with a phase-shifting mask
2. 2×2Phase Mask for Arbitrary Pattern Formation
3. Phase-shifting masks for microlithography: automated design and mask requirements
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2. Signal-to-noise-ratio limit to the depth-of-field extension for imaging systems with an arbitrary pupil function;Journal of the Optical Society of America A;2009-03-19
3. True process variation aware optical proximity correction with variational lithography modeling and model calibration;Journal of Micro/Nanolithography, MEMS, and MOEMS;2007-07-01
4. Fast lithography simulation under focus variations for OPC and layout optimizations;SPIE Proceedings;2006-03-10
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