Metrological sensitivity improvement of through-focus scanning optical microscopy by controlling illumination coherence-Reference-Cited by-同舟云学术

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Metrological sensitivity improvement of through-focus scanning optical microscopy by controlling illumination coherence

Published:2019-01-23 Issue:3 Volume:27 Page:1981
ISSN:1094-4087
Container-title:Optics Express
language:en
Short-container-title:Opt. Express

Author:

Park Shin-Woong,You Byeong Geon,Park Gyunam,Kim Youngbaek,Lee Junho,Cho Joong Hwee,Yi Yun,Kim Hwi

Funder

Korea Semiconductor Research Consortium

Ministry of Trade, Industry and Energy

National Research Foundation of Korea

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference18 articles.

1. Through-focus scanning optical microscopy

2. TSOM method for semiconductor metrology

3. TSOM Method for Nanoelectronics Dimensional Metrology

4. Noise analysis for through-focus scanning optical microscopy

5. Nanometrology using a through-focus scanning optical microscopy method

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. MEMS High Aspect Ratio Trench Three-Dimensional Measurement Using Through-Focus Scanning Optical Microscopy and Deep Learning Method;Applied Sciences;2022-08-23

2. Defect height estimation via model-less TSOM under optical resolution;Optics Express;2021-08-10

3. Motion-free TSOM using a deformable mirror;Optics Express;2020-05-14

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