Optical measurement of depth and duty cycle for binary diffraction gratings with subwavelength features-Reference-Cited by-同舟云学术

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Optical measurement of depth and duty cycle for binary diffraction gratings with subwavelength features

Published:2003-06-01 Issue:16 Volume:42 Page:3234
ISSN:0003-6935
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Marciante John R.,Farmiga Nestor O.,Hirsh Jeffrey I.,Evans Michelle S.,Ta Hieu T.

Publisher

The Optical Society

Reference7 articles.

1. General Ray-Tracing Procedure†

2. Integrated circuit metrology with confocal optical microscopy

3. Metrology of subwavelength photoresist gratings using optical scatterometry

4. Ellipsometric scatterometry for the metrology of sub-01-μm-linewidth structures

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