Sub-nanometer scale depth patterning on sapphire crystal by femtosecond soft x-ray laser pulse irradiation

Author:

Mikami Katsuhiro1,Ishino Masahiko2ORCID,Motoyama Hiroto3,Dinh Thanh-Hung2,Yokomae Shunya4,Yamaguchi Gota5,Egawa Satoru3,Sakaue Kazuyuki3,Mimura Hidekazu3,Higashiguchi Takeshi6ORCID,Kubota Yuya5,Owada Shigeki57,Iwasaki Atsushi3,Inubushi Yuichi57,Nishikino Masaharu2

Affiliation:

1. Kindai University

2. National Institutes for Quantum Science and Technology (QST)

3. The University of Tokyo

4. Natsume Optical Corporation

5. RIKEN SPring-8 Center

6. Utsunomiya University

7. Japan Synchrotron Radiation Research Institute

Abstract

Damage thresholds and structures on a metal aluminum and an aluminum oxide crystal induced by the soft x-ray free electron laser irradiations were evaluated. Distinctive differences in damage thresholds and structures were observed for these materials. On the aluminum oxide crystal surface, in particular, a novel, to the best of our knowledge, surface processing, which we suggest defining as peeling,” was recognized. Surface structures formed by peeling had extremely shallow patterning of sub-nanometer depth. For the newly observed peeling process, we proposed a scission of chemical bond, i.e., binding energy model, in the crystal.

Funder

Quantum Leap Flagship Program

Japan Society for the Promotion of Science

Publisher

Optica Publishing Group

Subject

Atomic and Molecular Physics, and Optics

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