Autofocusing system for spatial light modulator-based maskless lithography-Reference-Cited by-同舟云学术

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Autofocusing system for spatial light modulator-based maskless lithography

Published:2016-03-08 Issue:8 Volume:55 Page:1863
ISSN:0003-6935
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Schlangen Sebastian,Ihme Maximilian,Rahlves Maik,Roth Bernhard

Funder

German Research Foundation (DFG)

Collaborative Research Center PlanOS

German Federation of Industrial Research Associations (AiF)

Publisher

The Optical Society

Reference16 articles.

1. Digital mirror devices and liquid crystal displays in maskless lithography for fabrication of polymer-based holographic structures

2. MEMS-based lithography for the fabrication of micro-optical components

3. High-speed and precision auto-focusing system for direct laser lithography

4. Probe-beam scan-type autofocus system using position-sensing detector for sub-half-micron lithography tools

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1. Simple visual focusing and alignment technology for digital lithography;Optics and Lasers in Engineering;2024-10

2. Multi-Focus Images Fusion for Fluorescence Imaging Based on Local Maximum Luminosity and Intensity Variance;Sensors;2024-07-29

3. Large range nano autofocus method based on differential centroid technique;Optics & Laser Technology;2023-04

4. Precise autofocus method based on an annular DOE and a cylindrical lens;Optik;2023-02

5. 3D Sub‐Diffraction Printing by Multicolor Photoinhibition Lithography: From Optics to Chemistry;Laser & Photonics Reviews;2021-12-13

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