Author:
Li Jie,Xue Ying,Xu Ke,Xing Zengshan,Wong Kam Sing,Lau Kei May
Abstract
Tuning the initial growth conditions of the low-temperature-InP (LT-InP) nucleation layer, we grew large-area InP laterally on SOI wafers using lateral aspect ratio trapping (LART) with high crystalline quality, on which small micro-lasers and large Fabry-Perot (FP) lasers with low lasing thresholds were demonstrated.