Pressure and velocity dependence of the material removal rate in the fast polishing process
Author:
Publisher
The Optical Society
Reference16 articles.
1. Physics of loose abrasive microgrinding
2. Re‐examination of Pressure and Speed Dependences of Removal Rate during Chemical‐Mechanical Polishing Processes
3. Chemical‐Mechanical Polishing for Fabricating Patterned W Metal Features as Chip Interconnects
4. Modeling of chemical-mechanical polishing with soft pads
5. Pad effects on material-removal rate in chemical-mechanical planarization
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2. Effect of geometry error on accuracy of large-diameter pads used for CMP dressing;The International Journal of Advanced Manufacturing Technology;2018-10-04
3. Research and progress of rapid polishing technology for large aperture optics;Sixth International Conference on Optical and Photonic Engineering (icOPEN 2018);2018-07-24
4. Numerical simulation and experimental study of surface waviness during full aperture rapid planar polishing;The International Journal of Advanced Manufacturing Technology;2018-05-24
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