Illumination uniformity improvement in digital micromirror device based scanning photolithography system-Reference-Cited by-同舟云学术

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Illumination uniformity improvement in digital micromirror device based scanning photolithography system

Published:2018-07-05 Issue:14 Volume:26 Page:18597
ISSN:1094-4087
Container-title:Optics Express
language:en
Short-container-title:Opt. Express

Author:

Xiong Zheng,Liu Hua,Chen Ronghuan,Xu Jia,Li Qiankun,Li Jinhuan,Zhang Wenjuan

Funder

Youth Science Foundation of Jilin Province

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference18 articles.

1. Plasmon resonances of Ag capped Si nanopillars fabricated using mask-less lithography

2. Batch fabrication of functional optical elements on a fiber facet using DMD based maskless lithography

3. Arbitrary photo-patterning in liquid crystal alignments using DMD based lithography system

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3. Image Accuracy Optimization Method for Maskless Lithography Based on DMD (Invited);CHIN J LASERS;2024

4. Photopolymerized 3D Printing Materials for Optical Elements;Advanced Optical Materials;2024-03

5. Study of Proximity Effect in Projection based Micro Vat Photopolymerization Process;Additive Manufacturing;2024-01

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