Athermal, fabrication-tolerant Si-SiN FIR filters for a silicon photonics foundry platform

Abstract

A means of athermalizing unbalanced Mach-Zehnder interferometers on a 300 mm silicon photonics foundry platform utilizing Si and SiN layers to produce the path imbalance is demonstrated. This technique can be applied to all other forms of finite impulse response filters, such as arrayed waveguide gratings. Wafer scale performance of fabricated devices is analyzed for their expected performance in the target application: odd-even channel (de)-interleavers for dense wavelength division multiplexing links. Finally, a method is proposed to improve device performance to be more robust to fabrication variations while simultaneously maintaining athermality.