Author:
Takashima Yuusuke,Nagamatsu Kentaro,Haraguchi Masanobu,Naoi Yoshiki
Abstract
An ultra-thin perfect absorber for deep ultraviolet light was realized using an Al/TiO2/AlN system. The TiO2 thickness was optimized using the Fresnel phasor diagram in complex space to achieve perfect light absorption. As a result of the calculation almost perfect absorption into the TiO2 film was found, despite the film being much thinner than the wavelength. An optimized Al/TiO2/AlN system was fabricated, and an average absorption greater than 97% was experimentally demonstrated at wavelengths of approximately 255–280 nm at normal light incidence. Our structure does not require nanopatterning processes, and this is advantageous for low-cost and large-area manufacturing.
Funder
Japan Society for the Promotion of Science
Subject
Atomic and Molecular Physics, and Optics
Cited by
6 articles.
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