Ultra-thin deep ultraviolet perfect absorber using an Al/TiO2/AlN system

Abstract

An ultra-thin perfect absorber for deep ultraviolet light was realized using an Al/TiO2/AlN system. The TiO2 thickness was optimized using the Fresnel phasor diagram in complex space to achieve perfect light absorption. As a result of the calculation almost perfect absorption into the TiO2 film was found, despite the film being much thinner than the wavelength. An optimized Al/TiO2/AlN system was fabricated, and an average absorption greater than 97% was experimentally demonstrated at wavelengths of approximately 255–280 nm at normal light incidence. Our structure does not require nanopatterning processes, and this is advantageous for low-cost and large-area manufacturing.